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Si

Silicon is the main element construct the Earth's crust, synthetic monocrystalline silicon is the base for modern electronics industries, and perhaps the most affordable infrared materials. Silicon is commonly used as an optical window primarily in the 3-5μm band, and also could be used for 6-15μm transmission while the thickness become a very critical parameter of the silicon optics. Silicon is often employed as a substrate for laser mirrors because of its high thermal conductivity and low density.

 

Silicon is commonly grown by CZ method and contains some oxygen which causes strong absorption band at 9μm, limit its transmission applications in 8-12μm.

 

Applications:

1.      Silicon is used as an optical window primarily in the 3-5μm band;

2.      Silicon lens are used for Thermal imaging and FLIR applications;

3.      Featured small density of 2.33 g/cm³(less than half that of Germanium or ZnSe), Silicon is ideally suited to weight sensitive applications, especially those in the 3-5μm region.

4.      Used for substrate of IR filters, beamsplitters.

5.      Thin windows less than 3mm could be used in the 5-15μm.

6.      Silicon is commonly used as substrate materials for laser mirrors because of its high thermal conductivity and low density.

 

Si components:

Ø Windows
Ø  Filters for IR detectors
Ø  Beamsplitters
Ø  Mirrors
Ø  Prisms, Wedges
Ø  Spherical Lenses
Ø  Aspherical lens, Diffractive aspherical lens
Ø  Other customs optics
 

TYPICAL SPECIFICATION

Ø  Dimensional Tolerance :+0.0/-0.1mm

Ø  Thickness Tolerance:  ±0.2mm

Ø  Center Thickness Tol.  ±0.2mm

Ø  Surface Quality :10/5

Ø  Centering: 3-5 arcminutes

Ø  Surface Accuracy: 1/10 λ @ 10.6μm

Ø  Parallelism : <1 acrminute 

Ø  Clear Aperture :90%

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